In this study, electrophoretic deposition (EPD) technique was used to deposit titanium dioxide (TiO2) thin films on conducting glass substrates for application in water purification from organic contaminants. Phenol was used as a model pollutant. The EPD suspension related parameters and deposition conditions were first optimized for good quality film deposits. The suspension stability and deposition conditions that result in good adherence of TiO2 particles to the substrate with homogeneous film coatings, is ethanol with a pH of 3.0, a TiO2 solid loading of 4.0 wt%, a 0.2 wt% iodine concentration in the solvent and a deposition voltage of 20.0V in a time of 210.0s. The photocatalytic activity of TiO2 thin films decreases exponentially with the ultraviolet light (UV) illumination time and it is also dependent on film thickness, sintering temperature and the intensity of the UV light. Highest rate of photocatalytic activity is observed at an optimal film thickness of 95.0 ± 2.0µm sintered at 300.0°C. The implications of these results are discussed for design of inexpensive waste water purification systems for light industries before discharge into the ecosystem.
Published in | Advances in Materials (Volume 6, Issue 4) |
DOI | 10.11648/j.am.20170604.11 |
Page(s) | 31-37 |
Creative Commons |
This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited. |
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Copyright © The Author(s), 2017. Published by Science Publishing Group |
Electrophoretic Deposition, Titanium Dioxide, Photocatalysis
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APA Style
Francis Nyongesa, Bernard Aduda. (2017). Electrophoretic Deposition of Titanium Dioxide Thin Films for Photocatalytic Water Purification Systems. Advances in Materials, 6(4), 31-37. https://doi.org/10.11648/j.am.20170604.11
ACS Style
Francis Nyongesa; Bernard Aduda. Electrophoretic Deposition of Titanium Dioxide Thin Films for Photocatalytic Water Purification Systems. Adv. Mater. 2017, 6(4), 31-37. doi: 10.11648/j.am.20170604.11
AMA Style
Francis Nyongesa, Bernard Aduda. Electrophoretic Deposition of Titanium Dioxide Thin Films for Photocatalytic Water Purification Systems. Adv Mater. 2017;6(4):31-37. doi: 10.11648/j.am.20170604.11
@article{10.11648/j.am.20170604.11, author = {Francis Nyongesa and Bernard Aduda}, title = {Electrophoretic Deposition of Titanium Dioxide Thin Films for Photocatalytic Water Purification Systems}, journal = {Advances in Materials}, volume = {6}, number = {4}, pages = {31-37}, doi = {10.11648/j.am.20170604.11}, url = {https://doi.org/10.11648/j.am.20170604.11}, eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.am.20170604.11}, abstract = {In this study, electrophoretic deposition (EPD) technique was used to deposit titanium dioxide (TiO2) thin films on conducting glass substrates for application in water purification from organic contaminants. Phenol was used as a model pollutant. The EPD suspension related parameters and deposition conditions were first optimized for good quality film deposits. The suspension stability and deposition conditions that result in good adherence of TiO2 particles to the substrate with homogeneous film coatings, is ethanol with a pH of 3.0, a TiO2 solid loading of 4.0 wt%, a 0.2 wt% iodine concentration in the solvent and a deposition voltage of 20.0V in a time of 210.0s. The photocatalytic activity of TiO2 thin films decreases exponentially with the ultraviolet light (UV) illumination time and it is also dependent on film thickness, sintering temperature and the intensity of the UV light. Highest rate of photocatalytic activity is observed at an optimal film thickness of 95.0 ± 2.0µm sintered at 300.0°C. The implications of these results are discussed for design of inexpensive waste water purification systems for light industries before discharge into the ecosystem.}, year = {2017} }
TY - JOUR T1 - Electrophoretic Deposition of Titanium Dioxide Thin Films for Photocatalytic Water Purification Systems AU - Francis Nyongesa AU - Bernard Aduda Y1 - 2017/08/22 PY - 2017 N1 - https://doi.org/10.11648/j.am.20170604.11 DO - 10.11648/j.am.20170604.11 T2 - Advances in Materials JF - Advances in Materials JO - Advances in Materials SP - 31 EP - 37 PB - Science Publishing Group SN - 2327-252X UR - https://doi.org/10.11648/j.am.20170604.11 AB - In this study, electrophoretic deposition (EPD) technique was used to deposit titanium dioxide (TiO2) thin films on conducting glass substrates for application in water purification from organic contaminants. Phenol was used as a model pollutant. The EPD suspension related parameters and deposition conditions were first optimized for good quality film deposits. The suspension stability and deposition conditions that result in good adherence of TiO2 particles to the substrate with homogeneous film coatings, is ethanol with a pH of 3.0, a TiO2 solid loading of 4.0 wt%, a 0.2 wt% iodine concentration in the solvent and a deposition voltage of 20.0V in a time of 210.0s. The photocatalytic activity of TiO2 thin films decreases exponentially with the ultraviolet light (UV) illumination time and it is also dependent on film thickness, sintering temperature and the intensity of the UV light. Highest rate of photocatalytic activity is observed at an optimal film thickness of 95.0 ± 2.0µm sintered at 300.0°C. The implications of these results are discussed for design of inexpensive waste water purification systems for light industries before discharge into the ecosystem. VL - 6 IS - 4 ER -